All 15 products from Zhuzhou Orient Kylin Special Metal Co., Ltd..
This copper sputtering target is available in purities ranging from 4N to 5N. It is produced using melting technology and applied in semiconductor, decorative coating, and advanced packing fields.

This high-purity tungsten sputtering target is designed for vacuum coating applications. It maintains hardness and ductility, making it suitable for semiconductor and micro-electronic applications.
This tantalum sputtering target is designed for semiconductor applications requiring thin film deposition. It provides a uniform and consistent tantalum layer.